The fabrication of large-scale periodic nanostructures on surfaces is of paramount importance in nanotechnology and materials science. The common techniques such as photolithography, electron-beam ...
LONDON A collaborative research project to develop lithography technology based on multibeam laser interference includes Russian, Welsh, Finnish and Spanish academic groups and a French startup ...
Graphene analogues, such as graphene oxide (GO) and its reduced forms (rGO), are fascinating carbon materials due to the complementary properties endowed by the sp3-sp2 interconversion, revealing the ...
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American lab is developing a BAT laser that could enable 'beyond EUV' lithography, provide 10X power efficiency boost
The Lawrence Livermore National Laboratory is working on a petawatt-class thulium laser that is said to be 10 times more efficient than the CO2 lasers used in EUV tools and could replace CO2 lasers in ...
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